The UBMS® Series is sputtering equipment equipped with an evaporation source developed in-house by Kobelco. The magnetic field configuration is optimized to strengthen plasma at deposition and improve the ion assist effect, which is effective for film quality control. As a result, film with good surface roughness can be achieved.

It is possible to form a film to improve adhesion by sputtering, and processing can also be performed using the PE-CVD method for deposition of DLC.
* PE-CVD method: Coating technology that uses gas as the deposition material. Methane and acetylene are mainly used for deposition of DLC film. The PE-CVD method enables deposition five or more times faster than the UBMS® method, thereby improving productivity, which is a problem of the UBMS® method, while maintaining the sliding properties.

Specifications can be customized to meet international safety standards. We can also tailor the specifications to meet your needs for safety standards developed in-house.